일반형 대상 – 나노메카트로닉스공학과 King of NANO
주제: Growth of Tantalum Nitride Films on Si by RF Reactive Sputtering : Effect of N2/Ar Flow Ratio
일반형 대상 – 나노메카트로닉스공학과 King of NANO
주제: Growth of Tantalum Nitride Films on Si by RF Reactive Sputtering : Effect of N2/Ar Flow Ratio